SISS

The Scientific International Symposium on SIMS and Related Techniques Based on Ion-Solid Interactions (SISS)
イオン固体相互作用に基づくSIMSと関連技術に関する科学国際シンポジウム

SISS initially stood for “Seikei University, the International Symposium on SIMS and related techniques based on ion-solid interactions”.

Scope:
SISS covers SIMS and related techniques based on ion-solid interactions: fundamentals, instrumentation, and application in various fields, such as semiconductors, industrial materials, biological, medical, and environmental sciences. We mainly have three sessions: Atom Probe, D-SIMS, and TOF-SIMS.

SISS Organizing Committee

Chair 　Toshio Seki (Kyoto University)
Advisor Masahiro Kudo (Seikei University)
Advisor Hisayoshi Yurimoto (Hokkaido University)
Advisor Jiro Matsuo (Kyoto University)
Akio Takano (TOYAMA)
Atsushi Sakaki (Nichia)
Junichiro Sameshima (Toray Research Center)
Hiroko Susa (Sony)
Ichiro Nomachi (Techno I.S.)
Kaori Jogo (Toshiba Nanoanalysis Corporation)
Kousuke Moritani (University of Hyogo)
Makishi Ishikawa (Ametek)
Manabu Hashimoto (IONTOF Japan)
Masahiro Taniguchi (Kanazawa Institute of Technology)
Masashi Nojima (Tokyo University of Science)
Masataka Ohgaki (Hitachi High-Tech Science)
Masayuki Okamoto (Kao)?
Naoya Sakamoto (Hokkaido University)
Reiko Saito (Toshiba)
Retsu Oiwa (TOYAMA)
Satoka Aoyagi (Seikei University)
Satoshi Ninomiya (University of Yamanashi)
Shinya Otomo (Furukawa Electric)
Tatsuya Ishikawa (ULVAC-PHI)
Yasuko Kajiwara (Murata Manufacturing )
Yasuyuki Asahara (Ametek)