The 9th International Symposium on SIMS and Related Techniques based on Ion-Solid Interactions,SISS-9 has been held on July 20-21, 2006 at Seikei University (Tokyo).
SIMS International Symposium Program
July 20-21, 2006 10:00-17:00
Seikei University
July 20th
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10:10 – 10:20 Opening Remarks
Prof. M. Kudo (Seikei Univ.)
10:20 – 10:40
Shave-off depth profiling: Depth profiling with an absolute depth scale
M. Nojima, T. Yamamoto, Y. Ishizaki, M. Owari and Y. Nihei (Tokyo Univ. of Sci.)
10:40 – 11:00
Influence of surface oxide on ultra-shallow depth profiling of arsenic in Silicon
Y. Kataoka and K. Yamazaki (Fujitsu Labs.)
11:00 – 11:40 (Invited Lecture)
Progress in nano-materials analysis using Tof-SIMS
Prof. Yong-Chien Ling, Bo-Jung Chen, Anil Vithal Ghule (Tsinghua University in Hsinchu)
11:40 – 13:00 Lunch
13:00 – 13:40 (Invited Lecture)
Novel SIMS with unique ion beams
Prof. Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Toshio Seki and Takaaki Aoki (Kyoto University)
13:40 – 14:20 (Invited Lecture)
Recent theoretical analysis of organic substances in XPS and SIMS
Prof. Kazunaka Endo (Kanazawa University)
14:20 – 14:40
Simulation of thermal decomposition process for polymers by using quantum molecular dynamics method
N. Kato, M. Kudo (Seikei Univ.), K. Endo, T. Ida, D. Matsumoto (Kanazawa Univ.)
14:40 – 15:00 Coffee Break
15:00 – 17:00 Poster Presentation
17:15 – 19:00 Social Meeting
July 21st
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10:00 – 10:20
Quantitative characterizations of styrene-butadiene core-shell latexes by TOF-SIMS and Pyrolysis GC/MS
T. Maekawa (Fuji Photo Film)
10:20 – 10:40
TOF-SIMS analysis of surfactants utilizing chemical modification technique
M. Okamoto (Kao Corp.)
10:40 – 11:00 Application of ToF-SIMS to the analysis of plant cell wall polymers
K. Saito, T. Kato, H. Takamori, T. Kishimoto, A. Yamamoto, K. Fukushima (Nagoya Univ.)
11:00 – 11:20
The application of TOF-SIMS to bioinformatics Faculty of Life and Environmental Science
S. Aoyagi (Shimane Univ.)
11:20 – 11:40
Depth Profile Analysis of Organic Devices Using TOF-SIMS with Gradient Shaving Preparation
T. Shibamori, H. Seki, T. Matsunobe, N. Man, and Y. Nakagawa (Toray Res. Center)
11:40 – 13:00 Lunch
13:00 – 13:40 (Invited Lecture) Characterization of various contaminants on electronic devices using surface analysis methods
Dr. Jae Chul Lee, Youngsu Chung, Ranju Jung, Hyung Ik Lee, Jeongyeon Won, Se Ahn Song (Samsung Advanced Institute of Technology)
13:40 – 14:20 (Invited Lecture)
Semiconductor Characterization by Secondary Ion Mass Spectrometry: Historical Perspective and Current State-of-the-Art
Dr. Charles W. Magee (Evans Analytical Group)
14:20 – 14:40 Coffee Break
14:40 – 15:20 (Presentation from Manufacturer)
(Ulvac Phi)
15:20 – 16:00 (Presentation from Manufacturer)
(Cameca)
16:00 – 16:40 (Presentation from Manufacturer)
Recent Developments in TOF-SIMS Instrumentation: From Cluster Ion Sources to Fully Automated Wafer Tools
Dr. Markus Terhorst, Rudolf Moellers, Felix Kollmer, Derk Rading, Thomas Grehl, and Ewald Niehuis (Ion-Tof)
16:40 – 16:50 Closing Remarks