May 31, 2012 (Thu)
Opening remark 10:00
[Dynamic SIMS 10:05-11:25]
O1-1. (10:05-10:35) – Invited –
Application of Dynamic SIMS to advanced materials in Korea
T. E. Hong
O1-2. (10:35-11:05) – Invited –
Study of differences of MCs+ and MCs2+ profile
T. Miyamoto, S. Numao, T. Hasegawa and A. Karen
O1-3. (11:05-11:25)
Ultra shallow implants metrology using Extremely Low Impact Energy (EXLIE) SIMS
A. Merkulov, S. Choi, P. Peres and M. Schuhmacher
(Break 11:25-11:40)
[Imaging SIMS 11:40-13:00]
O1-4. (11:40-12:10) – Invited –
Applications of high resolution SIMS imaging in biological and nuclear materials
K.L. Moore, H. Jiang, S.S. Yardley, S. Lozano-Perez, F. Christien and C.R.M. Grovenor
O1-5. (12:10-12:40) – Invited –
Imaging of oxygen diffusion phenomenon in oxide semiconductor ceramics
I. Sakaguchi, K. Watanabe, S. Hishita and N. Ohashi
O1-6. (12:40-13:00)
Mass Imaging with Cluster Ion Beams
J. Matsuo, S. Nakagawa, M. Py, K. Ichiki, T. Aoki and T. Seki
(Lunch 13:00–14:00)
[Atom Probe 14:00-15:00]
O1-7. (14:00-14:30) – Invited –
Atom Probe Tomography of Semiconducting Materials
A. Shariq, S. Kölling, K. Wedderhoff, and S. Teichert
O1-8. (14:30-15:00) – Invited –
Laser-assisted Atom Probe Tomography of Isotope-enriched Oxide and Nitride Thin Films
T. Kinno, M. Tomita, S. Takeno
(Break 15:00-15:15)
[Sponsored session I 15:15-16:15]
S1-1. (15:15-15:45)
AMETEK
S1-2. (15:45-16:15)
Toyama
[SIMS XIX announcement 16:15-16:25]
[Poster short presentation 16:25-16:55]
(Break 16:55-17:10)
[Poster Session 17:10-18:20]
P-1. Progress status of a vacuum-type electrospray droplet impact beam source
S. Ninomiya, L. C. Chen, Y. Sakai and K. Hiraoka
P-2. Evaluation of monolayers of phenylene sulfide oligomers on metal surfaces using
TOF-SIMS
M. Inoue, T. Mitsuoka, Y. Kikuzawa and H. Takeuchi
P-3. Observation of a LiCoO
2 cathode material of a Li-ion Battery using TOF –SIMS
M. Ohnishi, O. Matsuoka, H. Nogi and T. Sakamoto
P-4. Cross-sectional distribution of secondary ions from negative-electrodes in
lithium-ion secondary batteries measured by FIB-TOF-SIMS
K. Mizuno, R. Satoh and T. Uchiyama
P-5. Isotope analysis of aerosol using secondary ion mass spectrometry
M. Nojima
P-6. Analysis of Sub-micron Aerosol Particles by High Resolution TOF-SIMS
N. Mayama, Y. Miura, T. Sakamoto and M. Fujii
P-7. Three dimensional imaging of semiconductor using TOF-SIMS
T. Miyasaka, A. Okamoto, M. Yoshida and T. Kono
P-8. Laser Post Ionization Mass Spectrometry of PAHs on Diesel Soot Particles
K. Ohishi, N. Mayama, K. Misawa, T. Sakamoto and M. Fujii
P-9. CAMECA IMS 7f: improved automation and new developments
P. Peres, F. Desse, F. Hillion, M. Schuhmacher and A. Merkulov
P-10. Boron concentration measurement in cultivated cells with Nano-SIMS
M. Py, M. Takeuchi, T. Seki, T. Aoki and J. Matsuo
P-11. Development of high-speed data-streaming system for time-of-flight mass
spectrometry
K. Bajo, O. Fujioka, S. Ebata, M. Ishihara, K. Uchino and H.Yurimoto
P-12. Atom Probe analysis of Conductive Polymer
M. Taniguchi, A. Yanagisawa and O. Nishikawa
P-13. The New Local Electrode for 3DAP Prepared for Reducing the Electric Stress
M. Morita, M. Shimizu, Y. Hanaoka and M. Owari
[Social meeting 18:20-19:30]
June 1, 2012 (Fri)
[TOF-SIMS I 9:00-10:00]
O2-1. (9:00-9:30) – Invited –
Ionic Liquid Matrix-Enhanced Secondary Ion Mass Spectrometry
A. V. Walker, J. J. Dertinger, and P. Kunnath
O2-2. (9:30-10:00) – Invited –
TOF-SIMS analysis for better understanding of tribology
S. Mori and H. Nanao
(Break 10:00-10:15)
[TOF-SIMS II 10:15-11:15]
O2-3. (10:15-10:35)
An Electrostatic Quadrupole Lens for Focusing Swift Heavy Ions in MeV-SIMS
T. Seki, S. Shitomoto, S. Nakagawa, T. Aoki and J. Matsuo
O2-4. (10:35-10:55)
Improvement of the Dynamic Range in TOF-SIMS Dual-Beam Depth Profiling
M. Terhorst, D.Rading, R. Moellers and E. Niehuis
O2-5. (10:55-11:15)
Evaluation of organic layers by means of TOF-SIMS and multivariate analysis
Y. Kajiwara and S. Aoyagi
(Break 11:15-11:30)
[Sponsored session II 11:30-12:30]
S2-1. (11:30-12:00)
ULVAC-PHI
S2-2. (12:00-12:30)
ION-TOF
(Lunch 12:30-13:30)
[Fundamental and Simulation 13:30-15:00]
O2-6. (13:30-14:00) – Invited –
Massive cluster sputtering of organic and nanocomposite materials
A.Delcorte, B. Czerwinski, O. A. Restrepo and B. J. Garrison
O2-7. (14:00-14:30) – Invited –
Large-scale MD Simulation of Huge Cluster Impact for Surface Process and Analysis
T. Aoki, T. Seki and J. Matsuo
O2-8. (14:30-15:00) – Invited –
IR and MS spectral simulation of polymer film by quantum chemical calculations using
the polymer models
K. Endo and N. Kato
(Break 15:00-15:15)
[Cluster Ion Beam I 15:15-16:15]
O2-9. (15:15-15:45) – Invited –
Damage profiles of solid surface bombarded by Ar gas cluster ion beam
H. J. Kang, Y. K. Kyoung, H. I. Lee, D. Yun, J. G. Chung and J. C. Lee
O2-10. (15:45-16:15) – Invited –
Recent Applications of Gas Cluster Ion Beam in the Surface Analysis
N. Sanada and T. Miyayama
(Break 16:15-16:30)
[Cluster Ion Beam II 16:30-17:40]
O2-11. (16:30-16:50)
Analysis of Molecular Surfaces by Using a Pulsed Beam of Large Argon Clusters
D. Rading, M. Terhorst, R. Moellers and E. Niehuis
O2-12. (16:50-17:20) – Invited –
Soft-sputtering of protein molecules in argon cluster SIMS
K. Moritani, N. Inui and K. Mochiji
O2-13. (17:20-17:40)
G-SIMS and g-ogram application to peptide samples using Ar cluster ion sources
S. Aoyagi, R. Havelund and I. Gilmore
[Closing Remark 17:40]